ION IMPLANTATION
IBS is the perfect partner for supporting your ion implantation needs,
whether it is production or R&D, IBS has a solution to fit all customer’s needs.
NEVER HAVE A BREAK
IN YOUR IMPLANT FLOW
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IN YOUR IMPLANT FLOW
The two IBS facilities in France and the UK provide backup for each other inside IBS.
IBS fabs
back-up each other
back-up each other
PLASMA IMMERSION
ION IMPLANTATION
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ION IMPLANTATION
Simultaneous implantation
on the whole wafer
Conformal 3D implantation
Ultra low energy (down to 30 eV)
with no risk of energy
contamination
Hot implant
The only world foundry for plasma immersion ion implant
IBS IS LEADING THE ION IMPLANT
FOUNDRY SERVICE
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FOUNDRY SERVICE
From ultra low energy to high doses
on most wafer types
and sizes ( 2” to 12" )
with a large variety of species
Get access to a large
scope of work
scope of work
A NEW WORLD WHERE
ION IMPLANTATION IS DEEPLY
REQUIRED
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ION IMPLANTATION IS DEEPLY
REQUIRED
SiC implantation up to 600 °C
3D conformal doping
Solar cell manufacturing
Surface treatment
( planar to 3D )
Innovative ion implantation
From our two production facilities in France and the UK, IBS operates a world class ion implantation
and full process manufacturing line service. IBS can process production volumes
from 2” to 12″ diameter substrates, as well as custom shapes, thicknesses and materials.
Beamline implantation services
Production
Standard Processing: Fabless, ion implanter-less or additionnal production capacity without CapEx heavy investment
Back-up: Breakdown, temporary overlay, wafer size upgrade…
R&D implantation
Specific processes: product development, test & evaluation
Various substrates, shapes
Exotic species
Heated/cooled, various angles…
SiC implantation
From room temperature to +600 °C implant
From samples to 6” wafer
Si, B, Al, N, C, P and much more
From 5 to 400 keV
Specific SiC ion implant simulations
Plasma Immersion Ion Implant services (PIII)
PULSION®
Available species:
• Doping: AsH3, PH3, BF3, B2H6
• Material modification: Ar, H2, He, CH4, SiH4, SiF4, Al, CF4, C2H2…
• Doping: AsH3, PH3, BF3, B2H6
• Material modification: Ar, H2, He, CH4, SiH4, SiF4, Al, CF4, C2H2…
Wafer size: from samples up to 300 mm
From medium to high doses
Extremely low to medium acceleration voltage: 50 V - 20 kV
Conformal doping for 3D
PIII & laser annealing combination
Annealing (and diffusion) depth is controlled very precisely
Room temperature doping
Wafer integrity
Junction depth from 10 nm to 15 nm
Application: Back side implantation, power components
SCOPE OF WORK
Dose / Energy
Wafer types
IBS can implant different types of wafers from 2" to 12''
- Si
- Si thin wafers / Taiko wafers
- SiC
- GaN
- InP / GaAs
- InSb
- HgCdTe
- LiNbO3
- Sapphire / Diamond / Quartz
TURNKEY SERVICES
PROCESS DEVELOPMENT
& SMALL SIZE PRODUCTION EXAMPLES
& SMALL SIZE PRODUCTION EXAMPLES
SENSORS
Radiation (Dosimeter gamma, Photodiodes)
Chemical ( CHEMFET)
Thermal (PT100)
Mechanical
PASSIVES
Resistors and capacitors
Yielding components
POWER COMPONENTS
Si Mosfet (2,4 kV) for military application
1 kV Bipolar for static circuit breaker
3,3 kV IGBT
On top of traditional semiconductor process steps IBS has developed specific technology bricks to meet SiC device manufacturing requirement
Inorganic masking & Hot implantation
High temperature implant annealing
Plasma etching
Fast annealing for metallization
IBS provides you with its skills and its know how to allow you to develop your own component
Process simulation using SILVACO software
Process integration
Electrical simulations
Design of masks
With its production line, IBS can produce components based on you requirement. Our fab operates with 2” to 6” compatible systems
Thanks to the CIMPACA capabilities , IBS can propose a complete set of tools that will perform the following tasks:
ON LINE CHARACTERIZATION
mechanical profilometer
Optical thickness measurment
Sheet resistance + prober IBS
PHYSICO & DEFCT ANALYSIS
D-SIMS & ToF-SIMS
Micro Auger & XPS
Dual beam FIB & TEM
IR Thermography
Laser decapsulation
OFF LINE CHARACTERIZATION
Layers thicknesses & morphology
Optical 3D Profilometer
Micro Raman
AFM Veeco
SEM
SINGLE STEP PROCESS
From single step process to complete product
We operate with a complete semiconductor manufacturing line!